Method of detecting alkali metal ions

Details Method of detecting alkali metal ions Method of detecting alkali metal ions

1985-01-22

1986-09-02

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

156626, 156643, 156662, H01L 21306

Patent

active

046094474

ABSTRACT:
A method of determining the presence of alkali metal ions in a substrate comprising silicon or silicon doped with a p-type conductivity modifier is provided. The substrate to be tested is etched in a tetrafluoromethane/oxygen plasma and the etch rate is compared against that of similar substrates containing known concentrations of alkali metal ions. The etch rate will increase with increasing alkali metal concentration. The subject method is particularly useful in determining the level of alkali metal ion contamination during multistep processing of the above-named substrates.

REFERENCES:
patent: 4289573 (1981-09-01), Economy et al.
patent: 4512847 (1985-04-01), Brunsch et al.
Makino et al., J. Elect. Chemical Society, vol. 128, No. 1, pp. 103-106, 1981.

Affiliated with

Also associated with

Rating

Method of detecting alkali metal ions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of detecting alkali metal ions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of detecting alkali metal ions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1096026