Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1996-09-11
1998-11-03
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430 5, 430296, G03F 900, G03C 500
Patent
active
058306129
ABSTRACT:
A method of detecting deficiency of an aperture used in a charged-particle-beam exposure process employing at least two exposure columns is disclosed, where each of the two exposure columns passes a charged-particle beam through the aperture formed through a mask to shape a cross section of the charged-particle beam before exposing the charged-particle beam onto an object. The method includes the steps of mounting masks having the same aperture to the at least two exposure columns; scanning, in each of the at least two exposure columns, the charged-particle beam over an area containing a mark on a surface substantially at the same height as the object after passing the charged-particle beam through the same aperture; obtaining, in each of the at least two exposure columns, a signal waveform corresponding to the scan by detecting charged particles scattered by the mark; and comparing the signal waveform between the at least two exposure columns.
REFERENCES:
patent: 4751169 (1988-06-01), Behringer
patent: 4797334 (1989-01-01), Glendinning
patent: 4816361 (1989-03-01), Glendinning
patent: 4906326 (1990-03-01), Amemiya et al.
Kawakami Ken-ichi
Kobayashi Katsuhiko
Ohno Manabu
Sagou Satoru
Sakamoto Kiichi
Fujitsu Limited
Young Christopher G.
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