Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle
Reexamination Certificate
2008-07-15
2011-11-08
Do, Thuan (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
C716S055000, C716S136000
Reexamination Certificate
active
08056020
ABSTRACT:
A method of designing a semiconductor integrated circuit includes: generating a layout data indicating a layout; and generating a mask data based on the layout data. The generating the mask data includes: referring to the layout data to extract a parameter that specifies a layout pattern around a target transistor included in the semiconductor integrated circuit, wherein the parameter includes at least a width of a device isolation structure around the target transistor; correcting a gate length and a gate width of the target transistor to offset a variation of a characteristic of the target transistor from a design value, the variation depending on the extracted parameter; and generating the mask data from the layout data in which the gate length and the gate width are corrected.
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Dimyan Magid
Do Thuan
Foley & Lardner LLP
Renesas Electronics Corporation
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