Method of depositing tungsten nitride using a source gas compris

Details Method of depositing tungsten nitride using a source gas compris Method of depositing tungsten nitride using a source gas compris

1996-06-12

1997-11-25

Niebling, John

Fishing, trapping, and vermin destroying

437192, 437193, 437 60, 437919, H01L 2128

Patent

active

056912358

ABSTRACT:
A method for depositing tungsten nitride uses a source gas mixture having a silicon based gas, such as silane for depositing the tungsten nitride to overlie a deposition substrate. A non-planar storage capacitor has a tungsten nitride capacitor electrode.

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