Metal working – Barrier layer or semiconductor device making – Barrier layer device making
Patent
1977-06-24
1978-03-28
Lazarus, Richard B.
Metal working
Barrier layer or semiconductor device making
Barrier layer device making
29 2511, 316 19, 427 58, H01J 902
Patent
active
040806952
ABSTRACT:
A method is provided for disposing a tripartite electrical connective-resistive system of related coating areas upon interior portions of a cathode ray tube envelope to effect arc suppression in the region of the electron generating assembly. The tripartite means is comprised of a first low resistive electrical conductive coating disposed on the forward portion of the envelope. A durable high resistive electrical conductive coating is disposed contiguous to and rearward of the first coating extending therefrom to the neck of the envelope. This resistive coating is an amorphous deposition of a homogeneous composition of an insulative vitreous frit material admixed with at least one particulate material selected from the group consisting essentially of cadmium oxide, indium oxide and copper oxide. The third component of the system is a second low resistive electrical conductive coating exhibiting a scratch-resistant surface disposed as a circumferential band in the forward portion of the neck member, being contiguous with the rear boundary of the high resistive coating.
REFERENCES:
patent: 2829292 (1958-04-01), De Vere Krause
patent: 3959686 (1976-05-01), Davis et al.
Gallaro Anthony V.
Williams G. Norman
Buffton Thomas H.
GTE Sylvania Incorporated
Lazarus Richard B.
O'Malley Norman J.
Rinn Frederick H.
LandOfFree
Method of depositing tripartite coating system for a cathode ray does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of depositing tripartite coating system for a cathode ray, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of depositing tripartite coating system for a cathode ray will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-636419