Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1986-04-21
1987-05-12
Newsome, John H.
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 86, C23C 1102
Patent
active
046649379
ABSTRACT:
A method of depositing a semiconductor alloy film onto a substrate by activating at least one group of free radicals and incorporating desired ones of the activated group into the film.
REFERENCES:
patent: 4226898 (1980-10-01), Ovshinsky et al.
patent: 4363828 (1982-12-01), Broosky et al.
patent: 4401054 (1983-08-01), Matsuo et al.
Allred David D.
Hudgens Stephen J.
Ovshinsky Stanford R.
Walter Lee
Energy Conversion Devices Inc.
Goldman Richard M.
Newsome John H.
Siskind Marvin S.
LandOfFree
Method of depositing semiconductor films by free radical generat does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of depositing semiconductor films by free radical generat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of depositing semiconductor films by free radical generat will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1801568