Coating processes – Coating by vapor – gas – or smoke – Metal coating
Patent
1994-09-16
1995-07-18
Beck, Shrive
Coating processes
Coating by vapor, gas, or smoke
Metal coating
4272551, 4272557, 313402, 445 47, C23C 1634, C23C 1606, H01J 2981
Patent
active
054339740
ABSTRACT:
A method for producing a shadow mask not susceptible to doming which includes in the preferred embodiment the step of heating boron in a vacuum atmosphere of 5.times.10.sup.-5 Torr at 2500.degree.-2600.degree. C. for 12-20 sec to deposit a boron layer of 1 .mu.m on the surface of a shadow mask and introducing nitrogen gas for 12-20 sec with maintaining the vacuum level of 10.sup.-4 Torr to form a boron nitride layer of 2 .mu.m. Titanium is then deposited in a vacuum atmosphere of 5.times.10.sup.-5 Torr at 2400.degree.-2600.degree. C. for 25-35 sec to form a titanium layer of 1-2 .mu.m on the boron nitride layer. The boron nitride layer having low thermal expansion coefficient prevents deformation by doming and the titanium layer having the good conductivity enables the anode voltage to be applied to the shadow mask.
REFERENCES:
patent: 3794873 (1974-02-01), Kaplan et al.
patent: 3809945 (1974-05-01), Roeder
patent: 4442376 (1984-04-01), Van Der Waal et al.
patent: 4668336 (1987-05-01), Shimkunas
patent: 4680243 (1987-07-01), Shimkunas et al.
patent: 4704094 (1987-11-01), Stempfle
patent: 4734615 (1988-03-01), Koike et al.
patent: 4904218 (1990-02-01), Tong
patent: 4964145 (1990-10-01), Maldonado
patent: 4978421 (1990-12-01), Bassous et al.
Beck Shrive
Chen Bret
Samsung Electron Devices Co. Ltd.
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