Method of depositing a silicon dioxide film

Details Method of depositing a silicon dioxide film Method of depositing a silicon dioxide film

1986-07-07

1987-09-15

Silverberg, Sam

Coating processes

With post-treatment of coating or coating material

Heating or drying

427169, 427435, 4274432, 10628734, 2523132, B05D 118

Patent

active

046939164

ABSTRACT:
A method of depositing a silicon dioxide film by bringing a substrate into contact with a hydrosilicofluoric acid solution supersaturated with silicon dioxide by the addition of an additive to deposit silicon dioxide film on the surface of the substrate, wherein the additive is at least one compound selected from the group consisting of an aluminum compound, a calcium compound, a magnesium compound, a barium compound, a nickel compound, a cobalt compound, a zinc compound, and a copper compound, and/or a metal or metals.

REFERENCES:
patent: 4468420 (1984-08-01), Kawahara et al.

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