Method of depositing a silicon dioxide film

Details Method of depositing a silicon dioxide film Method of depositing a silicon dioxide film

1990-09-07

1991-12-17

Bell, Janyce

Coating processes

Optical element produced

Transparent base

427108, 427345, 427435, 4274432, B05D 506

Patent

active

050734083

ABSTRACT:
A method of depositing a silicon dioxide film on the surface of a substrate such as alkali-containing glass by bringing the substrate into contact with a treating solution comprising a hydrosilicofluoric acid solution supersaturated with silicon dioxide, which is obtained by increasing the temperature of a hydrosilicofluoric acid solution substantially saturated with silicon dioxide.

REFERENCES:
patent: 2490662 (1949-12-01), Thomsen
patent: 2505629 (1950-04-01), Thomsen et al.
patent: 4468420 (1984-08-01), Kawahara et al.

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