Method of depositing a polycrystalline diamond layer on a nitrid

Coating processes – Coating by vapor – gas – or smoke – Carbon or carbide coating

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427307, 427577, 427122, C23C 1626, B05D 310

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059254130

ABSTRACT:
A method of depositing a polycrystalline diamond layer on a nitride substrate is disclosed, which comprises chemically-etching the nitride substrate with a KOH or NaOH solution or melt and depositing the polycrystalline diamond layer on the nitride substrate from a vapor phase, wherein the etching temperature, time and concentration of the etchant are controlled so that at least 75% of the interface between the substrate and the diamond layer is covered by diamond crystals, each diamond crystal having a contact area with the substrate of .gtoreq.20 um.sup.2.

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"Effective thermal resistance at diamond boundaries in mems", Kenneth E. Goodson et al, Proceedings of the ASME Dynamic System and Control Division ASME 1995, pp. 925-930, No month data|.

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