Method of depositing a metal film on a silyl hydride containing

Details Method of depositing a metal film on a silyl hydride containing Method of depositing a metal film on a silyl hydride containing

1992-04-01

1994-01-25

Shine, W. J.

Coating processes

With pretreatment of the base

4273833, 4273835, 502253, 502439, B05D 304, B05D 510, B01J 3716, B01J 2108

Patent

active

052814408

ABSTRACT:
A method of depositing a metal film on a silyl hydride surface of a solid such as silica gel, the solid normally having hydroxyl groups, the metal with a valence of zero being deposited on the surface by reaction of a metal ion in a solution with the hydrogens of the silyl hydrides. The above method is used to easily remove metal ions from a solution and also the method is a basis for determining the number of silyl hydride groups on the surface of the solid.

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Kol'tsov, S. I., Aleskovskii, V. B., "The Effect of the Degree of Dehydration of Silica Gel", Russ. J. Phys. Chem., 1967, 41, 336-7.
Budkevich, I. B. et al., "Reduction properties of hydridepolysiloxane Xerogel", Kolloidn. Zh., 1966, 28(1), 21-6 (Russ).

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