Method of depositing a metal-containing film

Details Method of depositing a metal-containing film Method of depositing a metal-containing film

2004-04-02

2008-08-19

Chen, Bret (Department: 1792)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S255350, C427S255390

Reexamination Certificate

active

07413776

ABSTRACT:
A method of depositing a Group IV metal-containing film on a substrate by conveying one or more of certain Group IV organometallic compounds in a gaseous phase to a deposition reactor containing a substrate and decomposing the one or more Group IV organometallic compounds to form a film of a Group IV metal on the substrate is provided. Such Group IV metal-containing films are particularly useful in the manufacture of electronic devices.

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