Method of depositing a metal

Details Method of depositing a metal Method of depositing a metal

1983-01-21

1984-04-10

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

C25D 502

Patent

active

044419643

ABSTRACT:
The invention relates to a method of depositing a metal on a heat-conducting substrate, in which a surface (2) of the substrate is irradiated at at least one area (3) in a bath by a laser beam and the metal is deposited from the bath at that area (3) on the substrate (1).
In order to improve the localization of the deposited metal at the irradiated area and in its immediate surroundings, according to the invention, the metal is deposited on a layer (7) of the substrate (1) located at least at the irradiated area (3) and in its non-irradiated surroundings.
The layer (7) has a heat conduction coefficient which is smaller than the heat conduction coefficient of the material of the substrate (1) adjoining the layer (7).

REFERENCES:
patent: 4217183 (1980-08-01), Melcher

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