Method of depositing a carbon film on a substrate and products o

Details Method of depositing a carbon film on a substrate and products o Method of depositing a carbon film on a substrate and products o

1982-09-28

1984-12-04

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192F, 204192E, 204192EC, 204192R, 428408, C23C 1500

Patent

active

044862865

ABSTRACT:
There is disclosed a method for depositing a diamond or diamond-like carbon film on at least one substrate employing a hydrocarbon gas and at least one gas which preferentially removes by chemical sputtering other forms of carbon, especially graphite from said film to thereby obtain useful carbon film coated products.

REFERENCES:
patent: 3840451 (1974-10-01), Golyanov
patent: 3961103 (1976-01-01), Aisenberg
Banks et al., J. Vac. Sci. Tech. 21, 1982, pp. 807-814.
Weissmantel et al., Thin Solid Films 63, (1979), pp. 315-325.
Spencer et al., Appl. Phys. Lett. 29, (1976), pp. 118-120.
Spitsyn et al., J. Crystal Growth 52, (1981), pp. 219-226.
Holland et al., J. Vac. Sci. Tech. 14, (1977), pp. 11-13.
Holland et al., Thin Solid Films 58, (1979), pp. 107-116.
Anderson et al., Thin Solid Films 63, (1979), pp. 155-160.
Morave C., Thin Solid Films 70, (1980), pp. 29-40.

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