Method of defining features on materials with a femtosecond...

Electric heating – Metal heating – By arc

Reexamination Certificate

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Reexamination Certificate

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07049543

ABSTRACT:
The invention relates to a pulsed laser ablation method of metals and/or dielectric films from the surface of a wafer, printed circuit board or a hybrid substrate. By utilizing a high-energy ultra-short pulses of laser light, such a method can be used to manufacture electronic circuits and/or electro-mechanical assemblies without affecting the material adjacent to the ablation zone.

REFERENCES:
patent: 4862803 (1989-09-01), Nerheim et al.
patent: 4908493 (1990-03-01), Susemihl
patent: 5329152 (1994-07-01), Janai et al.
patent: 5656186 (1997-08-01), Mourou et al.
patent: 5717699 (1998-02-01), Haag et al.
patent: 6150630 (2000-11-01), Perry et al.
patent: 6180915 (2001-01-01), Sugioka et al.
patent: 6268586 (2001-07-01), Stuart et al.
patent: 6333485 (2001-12-01), Haight et al.
patent: 6470802 (2002-10-01), Neyer et al.
patent: 6552301 (2003-04-01), Herman et al.
patent: 6746881 (2004-06-01), Charpentier et al.
patent: 2002/0125230 (2002-09-01), Haight et al.
patent: 2003/0136769 (2003-07-01), Lin et al.
patent: 7-100680 (1995-04-01), None
patent: 2002-160079 (2002-06-01), None
patent: 2003-133690 (2003-05-01), None
patent: WO-02/060636 (2002-08-01), None
patent: WO-2004/013900 (2004-02-01), None

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