Method of defect inspection of graytone mask and apparatus...

Details Method of defect inspection of graytone mask and apparatus... Method of defect inspection of graytone mask and apparatus...

2005-05-17

2005-05-17

Nguyen, Tu T. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

06894774

ABSTRACT:
A method of defect inspection of a graytone mask having a opaque part, a transmission part and a graytone part aimed at selectively varying the thickness of a photoresist film by decreasing the amount of light transmitted through an area wherein the amount of light transmitted therethrough is regulated. The method is characterized in that a transmittance signal obtainable by scanning a pattern in the mask is employed and that thresholds8aand8bfor extracting transmittance defects in the graytone part are provided with respect to the transmittance signal7,whereby it is decided that the transmittance defect is produced in the graytone part in case where the transmission signals exceed the thresholds respectively.

REFERENCES:
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patent: 9-292347 (1997-11-01), None
patent: 11-95410 (1999-04-01), None

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