Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment
Reexamination Certificate
2005-10-04
2005-10-04
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Processes
Hollow work, internal surface treatment
C134S002000, C134S003000, C134S019000, C134S902000, C438S905000
Reexamination Certificate
active
06951220
ABSTRACT:
A method of performing decontamination of a chamber for use in an IC fabrication system includes providing wet oxygen or a mixture comprising hydrochloric gas and oxygen in the chamber and raising the temperature in the chamber from a first lower temperature to a second higher temperature to cause the wet oxygen or the mixture comprising hydrochloric gas and oxygen to react with the germanium.
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patent: 5899752 (1999-05-01), Hey et al.
patent: 6605520 (2003-08-01), Cheong
patent: 2003/0221708 (2003-12-01), Ly et al.
patent: 2000-38674 (2000-02-01), None
Arasnia Farzad
Besser Paul R.
Ngo Minh V.
Xiang Qi
Advanced Micro Devices , Inc.
Foley & Lardner LLP
Kornakov M.
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