Method of decontaminating equipment

Cleaning and liquid contact with solids – Processes – Hollow work – internal surface treatment

Reexamination Certificate

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Details

C134S002000, C134S003000, C134S019000, C134S902000, C438S905000

Reexamination Certificate

active

06951220

ABSTRACT:
A method of performing decontamination of a chamber for use in an IC fabrication system includes providing wet oxygen or a mixture comprising hydrochloric gas and oxygen in the chamber and raising the temperature in the chamber from a first lower temperature to a second higher temperature to cause the wet oxygen or the mixture comprising hydrochloric gas and oxygen to react with the germanium.

REFERENCES:
patent: 5358895 (1994-10-01), Steele et al.
patent: 5833290 (1998-11-01), Curelop et al.
patent: 5899752 (1999-05-01), Hey et al.
patent: 6605520 (2003-08-01), Cheong
patent: 2003/0221708 (2003-12-01), Ly et al.
patent: 2000-38674 (2000-02-01), None

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