Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent
1991-12-09
1993-04-27
Langel, Wayne
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Halogenous component
423481, 423483, C01B 701, C01B 719, C01B 724
Patent
active
052060039
ABSTRACT:
An excellent method of decomposing flon is provided which can decompose flon economically with high decomposition efficiency without necessitating high temperature and high pressure by contacting a gas containing a flon with a catalyst at a condition of a temperature of not less than 200.degree. C. and space velocity of not over than 50,000 (hr.sup.-1).
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Hara Katsunosuke
Hiraoka Masakatsu
Imoto Yoshinori
Hiraoka Masakatsu
Langel Wayne
NGK Insulators Ltd.
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