Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
Reexamination Certificate
2007-08-07
2007-08-07
Smoot, Stephen W. (Department: 2813)
Semiconductor device manufacturing: process
With measuring or testing
Optical characteristic sensed
C438S487000, C257SE21133, C117S904000
Reexamination Certificate
active
11017826
ABSTRACT:
A crystallization method is provided which improves a crystallization process by deciding a best-fit focal plane for a laser beam using a test mask and then applying the decided best-fit focal plane to the crystallization process. The crystallization method includes loading a test mask on a mask stage; deciding a best-fit focal plane by performing a crystallization test using the test mask, checking the test result and deciding conditions of a best-fit focal plane from the test result; moving the mask stage to a position corresponding to the best-fit focal plane; loading a mask for crystallization process onto the moved mask stage; and performing the crystallization process using the mask for crystallization process.
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Jung Yun Ho
Kim Young Joo
Seo Hyun Sik
You Jae-Sung
LG.Philips LCD Co. , Ltd.
Smoot Stephen W.
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