Method of creating a patterned monolayer on a surface

Etching a substrate: processes – Pattern or design applied by transfer

Reexamination Certificate

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C216S041000

Reexamination Certificate

active

07371331

ABSTRACT:
A method is provided for creating a patterned monolayer on a substrate. First, organic molecules are prepared that have self-assembling properties. These molecules are applied to an aligning substrate. Then, the aligning surface is applied to the substrate, then separated from the substrate, leaving ordered patterns of the organic molecules on the substrate.

REFERENCES:
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patent: 5578351 (1996-11-01), Shashidhar et al.
patent: 6180239 (2001-01-01), Whitesides et al.
patent: 6465054 (2002-10-01), Effenberger
patent: 6562398 (2003-05-01), Braach-Maksvytis et al.
patent: 2003/0024632 (2003-02-01), Hahn et al.

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