Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-02-16
2009-12-29
Rosasco, Stephen (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C716S030000, C716S030000
Reexamination Certificate
active
07638244
ABSTRACT:
A method of correcting mask data performs a proximity effect correction process to a pattern shape of a photomask to form a photosensitive material film provided on a substrate to be processed or a film to be processed by using the photosensitive material film as a mask into a pattern of a desired-shape. Model-based proximity effect correction is performed to the pattern shape of the photomask to correct the pattern shape of the photomask, an estimated shape of the pattern in the photosensitive material film or the film to be processed is calculated on the basis of the pattern shape of the photomask subjected to the model-based proximity effect correction, an error between the calculated estimated shape and the desired shape is calculated, and rule-based proximity effect correction is performed to a predetermined interested portion on the basis of the calculated error to further correct the pattern shape of the photomask.
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Notice of Reasons for Rejection from the Japanese Patent Office, mailed Apr. 21, 2009, in Japanese Patent Application No. 2004-038034, and English translation thereof.
Final Notice of Rejection mailed Jul. 14, 2009, in corresponding Japanese patent application No. 2004-038034, and English-language translation of same.
Alam Rashid
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Kabushiki Kaisha Toshiba
Rosasco Stephen
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