Method of correcting an error in phase difference in a phase...

Details Method of correcting an error in phase difference in a phase... Method of correcting an error in phase difference in a phase...

2011-08-16

2011-08-16

Young, Christopher G (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C382S144000

Reexamination Certificate

active

07998643

ABSTRACT:
Disclosed is a method of correcting an error in a phase difference in a phase shift mask, in which a phase shift pattern is formed on a light transmitting substrate, wherein the method includes: determining generation of an error in a phase difference by measuring a phase of a light transmitted through the light transmitting substrate and a phase of a light transmitted through the phase shift pattern; and correcting the error in the phase difference by coating a self-assembled monolayer on the light transmitting substrate when the error of the phase difference is generated.

REFERENCES:
patent: 7389491 (2008-06-01), Park et al.
patent: 7691541 (2010-04-01), Crocker et al.

Affiliated with

Also associated with

Rating

Method of correcting an error in phase difference in a phase... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of correcting an error in phase difference in a phase..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of correcting an error in phase difference in a phase... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2663199