Method of controllong the deposition of hydrogenated amorphous s

Details Method of controllong the deposition of hydrogenated amorphous s Method of controllong the deposition of hydrogenated amorphous s

1983-03-28

1985-06-25

Lawrence, Evan K.

Coating processes

Measuring, testing, or indicating

118 501, 118665, 118712, 118723, 427 39, 427 74, B05D 306, C23C 1308

Patent

active

045253757

ABSTRACT:
An improved method and apparatus for the controlled deposition of a layer of hydrogenated amorphous silicon on a substrate. Means is provided for the illumination of the coated surface of the substrate and measurement of the resulting photovoltage at the outermost layer of the coating. Means is further provided for admixing amounts of p type and n type dopants to the reactant gas in response to the measured photovoltage to achieve a desired level and type of doping of the deposited layer.

REFERENCES:
patent: 4033287 (1977-07-01), Alexander, Jr. et al.
patent: 4223048 (1980-09-01), Engle, Jr.
patent: 4328258 (1982-05-01), Coleman

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