Method of controlling removal of photoresist in openings of...

Details Method of controlling removal of photoresist in openings of... Method of controlling removal of photoresist in openings of...

2006-01-03

2006-01-03

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S311000, C382S144000

Reexamination Certificate

active

06982138

ABSTRACT:
A method of controlling removal of photoresist in openings of a photoresist mask has the steps of obtaining in a scanning electron microscope a video signal of a bottom of an opening of a photoresist mask, and comparing values of the video signal in different points of an image which contains the opening to be controlled.

REFERENCES:
patent: 6143473 (2000-11-01), Hoshino et al.
patent: 6200736 (2001-03-01), Tan
patent: 6303931 (2001-10-01), Menaker et al.
patent: 6641975 (2003-11-01), Takeda et al.

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