Method of controlling metallic layer etching process and...

Details Method of controlling metallic layer etching process and... Method of controlling metallic layer etching process and...

2006-09-26

2006-09-26

Gabor, Otilia (Department: 2884)

Radiant energy

Invisible radiant energy responsive electric signalling

Infrared responsive

C438S710000

Reexamination Certificate

active

07112795

ABSTRACT:
In a method of controlling a metallic layer etching process for fabricating a semiconductor device or a liquid crystal display device, the composition of the etchant used in etching the metallic layer is first analyzed with the NIR spectrometer. The state of the etchant is then determined by comparing the analyzed composition with the reference composition. In case the life span of the etchant comes to an end, the etchant is replaced with a new etchant. By contrast, in case the life span of the etchant is left over, the etchant is delivered to the next metallic layer etching process. This analysis technique may be applied to the etchant regenerating process in a similar way.

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