Method of controlling a lithographic processing cell, device...

Details Method of controlling a lithographic processing cell, device... Method of controlling a lithographic processing cell, device...

2007-03-27

2007-03-27

Rutledge, D. (Department: 2851)

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

C355S077000, C414S935000, C718S001000, C700S100000, C700S121000

Reexamination Certificate

active

11418146

ABSTRACT:
A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.

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Van den Nieuwelaar et al., “Design of Supervisory Machine Control”, European Control Conference 2003.
Marc Wennink, “Algorithmic Support for Automated Planning Boards”, PhD Thesis, Eindhoven University of Technology, pp. 1-139 (1995).

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