Method of controlling a lithographic processing cell, device...

Details Method of controlling a lithographic processing cell, device... Method of controlling a lithographic processing cell, device...

2006-06-27

2006-06-27

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000, C414S940000

Reexamination Certificate

active

07068351

ABSTRACT:
A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.

REFERENCES:
patent: 5975740 (1999-11-01), Lin et al.
patent: 6526329 (2003-02-01), Tateyama et al.
patent: 6580955 (2003-06-01), Lin et al.
patent: 6678572 (2004-01-01), Oh
patent: 6698944 (2004-03-01), Fujita
patent: 6766285 (2004-07-01), Allen et al.
Van den Nieuwelaar et al.,“Design of Supervisory Machine Control”, European Control Conference 2003, 6 pages.
Marc Wennink,“Algorithmic Support for Automated Planning Boards”, PhD Thesis, Eindhoven University of Technology, pp. 1-139, (1995).

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