Method of controlling a fabrication process using an...

Details Method of controlling a fabrication process using an... Method of controlling a fabrication process using an...

2007-11-07

2009-10-06

Pham, Thanh V (Department: 2894)

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

C438S014000, C438S017000, C438S018000, C438S032000, C438S400000, C438S455000, C257SE21525, C257SE21529, C257SE21530

Reexamination Certificate

active

07598099

ABSTRACT:
Embodiments of controlling a fabrication process using an iso-dense bias are generally described herein. Other embodiments may be described and claimed.

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U.S. Appl. No. 11/848,214, Liu et al., “Automated process control using parameters determined with approximation and fine diffraction models”.

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