Method of constructing dished ion thruster grids to provide hole

Details Method of constructing dished ion thruster grids to provide hole Method of constructing dished ion thruster grids to provide hole

1975-01-20

1976-04-06

Mehr, Milton S.

Metal working

Barrier layer or semiconductor device making

Barrier layer device making

H01J 900

Patent

active

039479331

ABSTRACT:
The center-to-center spacings of a photoresist pattern for an array of holes applied to a thin metal sheet are increased by uniformly stretching the thin metal sheet in all directions along the plane of the sheet. The uniform stretching is provided by securely clamping the periphery of the sheet and applying an annular force against the face of the sheet, within the periphery of the sheet and around the photoresist pattern. The technique used in the construction of ion thruster grid units wherein the outer or downstream grid is subjected to uniform stretching prior to convex molding. The technique provides alignment of the holes of grid pairs so as to direct the ion beamlets in a direction parallel to the axis of the grid unit and thereby provide optimization of the available thrust.

REFERENCES:
patent: 3296850 (1967-01-01), Fiore
patent: 3809945 (1974-05-01), Roeder
patent: 3864797 (1975-02-01), Banks

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