Method of constructing a hologram on a photoresist detector

Radiation imagery chemistry: process – composition – or product th – Holographic process – composition – or product

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430 2, 350 36, 350 361, 350 381, 350 383, 350 384, G03C 500

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043438741

ABSTRACT:
A photoresist holographic technique in which the object modified and reference beam are of substantially the same average intensity, the photoresist is exposed for a long period of time and subsequently developed for a very short period of time.

REFERENCES:
patent: 3729634 (1973-04-01), Jensen et al.
patent: 3755677 (1973-08-01), Paul et al.
patent: 4032338 (1977-06-01), Gange
Iwata et al., Applied Optics, Jun. 1974, vol. 13, No. 6, pp. 1327-1336.
Bartolini, Applied Optics, vol. 13, No. 1, Jan. 1974, 129-139.
Beesley et al., Applied Optics, vol. 9, No. 12, Dec. 1970, pp. 2720-2724.
Bartolini et al., Applied Optics, vol. 9, No. 10, 1970, pp. 2283-2290.
Bartolini et al., Journal of the Electrical Chemical Society, vol. 120, No. 10, pp. 1408-1413, Oct. 1973.

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