Coating processes – Immersion or partial immersion – Chemical compound reducing agent utilized
Patent
1988-04-29
1990-03-13
Beck, Shrive
Coating processes
Immersion or partial immersion
Chemical compound reducing agent utilized
427436, 427437, 106 123, 106 126, B05D 118
Patent
active
049082426
ABSTRACT:
Electroless metal plating solutions are formulated and controlled to provide high quality metal deposits by establishing the intrinsic cathodic reaction rate of the solution less than 110% of the intrinsic anodic reaction rate. Methods are provided to formulate electroless copper plating solutions which can deposit copper on printed wiring boards of quality sufficient to pass a thermal stress of 10 seconds contact with molten solder at 288.degree. C. without cracking the copper deposits on the surface of the printed wiring boards or in the holes. The ratio of the anodic reaction rate to the cathodic reaction rate can be determined by electrochemical measurements, or it can be estimated by varying the concentration of the reactants and measuring the plating rates.
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Hughes Rowan
Paunovic Milan
Zeblisky Rudolph J.
Beck Shrive
Dang Vi Duong
Kollmorgen Corporation
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