Method of compensation for electron beam dose

Details Method of compensation for electron beam dose Method of compensation for electron beam dose

1997-08-25

1998-10-20

Nguyen, Kiet T.

Radiant energy

With charged particle beam deflection or focussing

With detector

2504922, 250398, H01J 37304

Patent

active

058250344

ABSTRACT:
A method of compensation to an electron beam dose for exposing an electron beam through an electron dose mask to an object is provided, which comprises the steps of measuring an actual opening area of the electron dose mask, and setting an optimum dose to the electron beam dose system with reference to the measured actual opening area of the electron dose mask, thereby forming on a wafer a pattern exactly corresponding to the designed pattern even if the electron beam mask has an opening pattern differing in size from the designed pattern.

REFERENCES:
patent: 5449915 (1995-09-01), Yamada et al.

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