Method of coating tungsten preferentially orientated in the <

Coating processes – Coating by vapor – gas – or smoke – Metal coating

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427 78, 4272551, 4272552, C23C 1600

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active

046595910

ABSTRACT:
In the reactive deposition from a gaseous phase containing tungsten hexafluoride and hydrogen on a substrate at an overall pressure of 10 to 100 hPa (low-pressure CVD method) an inert carrier gas is enriched with a rare earth metal acetyl acetonate hydrate and is conducted across the substrate and the growing tungsten layer together with the reactive gases tungsten hexafluoride and hydrogen.

REFERENCES:
patent: 2208920 (1940-07-01), Allen
patent: 3620838 (1971-11-01), Peehs
patent: 3635760 (1972-01-01), Van Someren
patent: 3894164 (1975-07-01), Dismukes et al.
patent: 4374901 (1983-02-01), Ferrar
patent: 4524297 (1985-06-01), Gartner

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