Method of coating the surface of a substrate and a coating mater

Details Method of coating the surface of a substrate and a coating mater Method of coating the surface of a substrate and a coating mater

1994-07-12

1997-10-21

Turner, Archene

Stock material or miscellaneous articles

Structurally defined web or sheet

Including components having same physical characteristic in...

428212, 428697, 428698, 428699, 428701, 428704, B23B 5100

Patent

active

056794487

ABSTRACT:
A method of surface coating a substrate made of metal or ceramic having a three dimensional configuration such as tools, dies or machinery parts, with a surface reinforcing film with good adhesion, at low temperature, in which at least one deposition film is formed on the surface of the substrate by a plasma vapor deposition CVD process, wherein the deposition film comprises:

REFERENCES:
patent: 5035957 (1991-07-01), Bartlett et al.
patent: 5071693 (1991-12-01), Sue et al.
patent: 5208102 (1993-05-01), Schulz et al.
patent: 5330853 (1994-07-01), Hofmann et al.
"Formation of TiAlN Film by Sputter Ion Plating", Hattori et alia.
"Titanium Aluminum Nitrate Films: A New Alternative to TiN Coatings", Munz Dec. 1986.

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