Coating processes – Centrifugal force utilized
Reexamination Certificate
2007-04-17
2007-04-17
Jolley, Kirsten (Department: 1762)
Coating processes
Centrifugal force utilized
C427S335000, C427S377000, C427S379000, C427S397800
Reexamination Certificate
active
10771637
ABSTRACT:
Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber3is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.
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Katayama Kyoshige
Mizutani Yoji
Muramatsu Makoto
Nagashima Shinji
Takeshita Kazuhiro
Jolley Kirsten
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Tokyo Electron Limited
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