Method of coating a thin film on a substrate

Details Method of coating a thin film on a substrate Method of coating a thin film on a substrate

1995-04-03

1998-04-07

Beck, Shrive

Coating processes

Solid particles or fibers applied

427348, 427421, 427600, 118323, 118300, 239 8, 239 99, 2391022, B05D 112, B05D 108

Patent

active

057361959

ABSTRACT:
A method for coating a substrate with a relatively thin, uniform film of a fluid with a minimum of waste. A volume of fluid is produced and the size and velocity of the volume of fluid are selected such that the volumes of fluid break up upon impact with the substrate without splashing or rippling. The apparatus and method are ideal for coating semiconductor wafers with a photoresist solution. The kinetic energy of the volume of fluid is adjusted to overcome the free energy associated with surface tension on impact. The collision of the fluid thus results in a uniform, thin coating of photoresist or other coating solution which may then be further processed by conventional techniques.

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G. Switzer, "A Versatile System for Stable Generation of Uniform Droplets", Review of Scientific Instruments (1991).

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