Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1995-02-14
1997-02-11
Warden, Jill
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 13, 134902, 134 15, B08B 300, B08B 304, B08B 312
Patent
active
056016557
ABSTRACT:
Method for cleaning substrates, particularly a method for removing soluble contaminants and particulate materials from the substrate surface. According to the method, a substrate is inverted and moved horizontally, while flowing cleaning fluid inclinedly upwardly towards the substrate and oppositely to the moving of the substrate; accoustically vibrating the cleaning fluid and, elevating the flowing cleaning fluid at a point adjacent the substrate surface, such that that the flowing cleaning fluid contacts the substrate surface and forms leading edge and trailing edge menisci between the flowing cleaning fluid and the moving substrate.
REFERENCES:
patent: 4004045 (1977-01-01), Stelter
patent: 4187868 (1980-02-01), Rudolphi
patent: 4370356 (1983-01-01), Bok
patent: 4696885 (1987-09-01), Vitan
patent: 4938257 (1990-07-01), Morris
patent: 5090432 (1992-02-01), Bran
patent: 5270079 (1993-12-01), Bok
patent: 5286657 (1994-02-01), Bran
Leenaars et al. "Marangoni Drying: A New Extremely Clean Drying Process" Langmuir 1990, vol. 6, pp. 1701-1703.
"Method & Apparatus for Cleaning Megasonics" EP Publication No. 0603008A1, Jun. 22, 1994.
Birbara Philip J.
Bok Hendrik F.
Markoff Alexander
Semmes David H.
Warden Jill
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