Method of cleaning substrate

Cleaning and liquid contact with solids – Processes – For metallic – siliceous – or calcareous basework – including...

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Details

134 2, 134 26, 134 28, 134 29, C03C 2300, B08B 300

Patent

active

056791712

ABSTRACT:
A method of cleaning the surface of a substrate, wherein the first step of the process of cleaning the substrate including a step of cleaning the surface of the substrate by an acidic solution, oxidizing solution, or alkaline solution, comprises a step of removing the natural oxide film formed on the surface of the substrate.

REFERENCES:
patent: 4795497 (1989-01-01), McConnell
patent: 4921572 (1990-05-01), Roche
patent: 5454901 (1995-10-01), Tsuji
patent: 5487398 (1996-01-01), Ohmi et al.
patent: 5571375 (1996-11-01), Izumi et al.

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