Method of cleaning storage case

Cleaning and liquid contact with solids – Processes – With treating fluid motion

Reexamination Certificate

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Details

C134S019000, C134S021000, C134S022180

Reexamination Certificate

active

07967917

ABSTRACT:
The present invention provides a method of cleaning a storage case to be used for storing or transporting mask substrates such as photomasks and photomask blanks, semiconductor substrates such as semiconductor wafers, pellicles, or the like. The present invention: facilitates a regular cleaning operation, can be used also for a storage case of a complicated shape, does not require a large scale equipment or an expensive equipment to facilitate an environmental countermeasure, and provides high cleaning effect. The method of cleaning a storage case polluted by adhesion of a foreign substance of an organic material, an ionic foreign substances or an ionic crystal foreign substance physically absorbed, comprises a step of placing the storage case still in air flow of cleaned air or an inert gas in a temperature range from room temperature to 80° C. for desorbing and removing the foreign substance adhered to the storage case.

REFERENCES:
patent: 5238503 (1993-08-01), Phenix et al.
patent: 5991965 (1999-11-01), Stroh et al.
patent: 6770109 (2004-08-01), Tanaka et al.
patent: 0813230 (1997-12-01), None
patent: 2002110759 (2002-04-01), None
patent: 2004-053817 (2004-02-01), None
patent: 2006-011048 (2006-01-01), None

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