Method of cleaning optical surfaces of an irradiation unit...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S50400H, C134S002000, C134S021000, C134S026000

Reexamination Certificate

active

08076655

ABSTRACT:
The present invention provides a method of cleaning optical surfaces in an irradiation unit in order to remove contaminations deposited on said optical surfaces. The method includes a cleaning step in which a first gas or gas mixture is brought into contact with said optical surfaces thereby forming a volatile compound with a first portion of said contaminations. In an operation pause of the irradiation unit prior to the cleaning step, a pretreatment step is performed, in which a second gas or gas mixture is brought into contact with said optical surfaces. Said second gas or gas mixture is selected to react with a second portion of said contaminations different from said first portion to form a reaction product, which is able to form a volatile compound with said first gas or gas mixture.

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patent: 6781685 (2004-08-01), Hamm
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patent: 7750326 (2010-07-01), Van Herpen et al.
patent: 2004/0007246 (2004-01-01), Chan et al.
patent: 2004/0011381 (2004-01-01), Klebanoff et al.
patent: 2006/0175558 (2006-08-01), Bakker et al.
patent: 1643310 (2006-04-01), None
patent: 2004104707 (2004-12-01), None
patent: 2006011105 (2006-02-01), None

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