Method of cleaning high density inductively coupled plasma chamb

Details Method of cleaning high density inductively coupled plasma chamb Method of cleaning high density inductively coupled plasma chamb

1995-02-28

1996-06-04

Breneman, R. Bruce

Fishing, trapping, and vermin destroying

118723E, 134 11, H01L 21465

Patent

active

055232612

ABSTRACT:
An inductively coupled plasma chamber having a capacitor electrode during cleaning of the plasma chamber.

REFERENCES:
patent: 5252178 (1993-10-01), Moslehi
patent: 5269881 (1993-12-01), Sekiya et al.
patent: 5309063 (1994-05-01), Singh
patent: 5449410 (1995-09-01), Chang et al.
patent: 5449432 (1995-09-01), Hanawa
Andrieu, X. et al., "New Conducting Polymer Networks", Journal of Power Sources, 43-44 (1993), pp. 445-451.

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