Method of cleaning glass substrate for magnetic disk or semicond

Details Method of cleaning glass substrate for magnetic disk or semicond Method of cleaning glass substrate for magnetic disk or semicond

1998-03-19

2000-04-11

Griffin, Steven P.

Etching a substrate: processes

Forming or treating optical article

134 11, 134 12, 134 13, 134 3, 204263, 205705, 216 97, B08B 600, C25F 100, C25B 900, B01D 1706, B44C 122

Patent

active

060484667

ABSTRACT:
To propose a method of cleaning a surface of a glass substrate fabricated by a process of strengthening a surface thereof by alkaline ion exchange reaction by selectively removing alkaline metal on the surface by cleaning the surface by using an activated ionic water produced by electric polarization and as a result, to provide a glass substrate for a magnetic disk having a magnetic medium with insignificant corrosion and excellent S/N ratio, in cleaning a glass substrate for a magnetic disk using a glass substrate pulled up from a chemically strengthening treatment solution produced by an alkaline ion exchange reaction, after a final polishing step of fabricating the glass substrate for a magnetic disk, the glass substrate is cleaned by an activated anodically electrolyzed water produced by electric polarization to thereby selectively remove the alkaline metal at the vicinity of the surface.

REFERENCES:
patent: 5543030 (1996-08-01), Shiramizu et al.
patent: 5578193 (1996-11-01), Aoki et al.
patent: 5635053 (1997-06-01), Aoki et al.
patent: 5676760 (1997-10-01), Aoki et al.
patent: 5725753 (1998-03-01), Harada et al.
patent: 5783790 (1998-07-01), Mitsumori et al.
patent: 5833831 (1998-11-01), Kitajima et al.
Aoki, et al.; "Wafer Process Using electrolysis Ionized Water," SEMI Technology Symposium, 1993, pp. 489-496.

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