Method of cleaning gases

Chemical apparatus and process disinfecting – deodorizing – preser – Process disinfecting – preserving – deodorizing – or sterilizing – A gas is substance acted upon

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422 24, 422168, 96 16, 96 69, 55DIG38, 134 13, 134902, A61L 920

Patent

active

061594210

ABSTRACT:
Method and apparatus for cleaning a gas for preventing the contamination of a surface of a substrate in a localized space are disclosed. A photocatalyst is provided in a selected area of the localized space and the photocatalyst, as it is illuminated with light, is contacted by the gas to be treated, whereby any noxious gases are removed from the treated gas. Alternatively, a unit apparatus composed of an ultraviolet radiation source, a photocatalyst, a photoelectron emitter and an electrode is installed in a selected area of the localized space and the gas to be treated is passed through the unit apparatus, whereby noxious gases and particulates are removed from the treated gas.

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patent: 5616532 (1997-04-01), Heller et al.
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patent: 5650126 (1997-07-01), Taoda et al.
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patent: 5853866 (1998-12-01), Watanabe et al.
patent: 5854169 (1998-12-01), Heller et al.
Kuki Seijo (Air Cleaning), vol. 33, No. 1, pp. 16-21, Jan. 1995, Toshiaki Fujii, et al., "Surface Contamination by Organic Compounds in Cleanroom Air".
Database WPI, Derwent Publications, AN 89-354130, JP 01 266 864, Oct. 24, 1989.
Kern, Werner. Handbook of Semiconductor Wafer Cleaning Technology, Noyes Publications (New Jersey): pp. 76, 77, 313, 1993.

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