Method of cleaning CVD apparatus

Details Method of cleaning CVD apparatus Method of cleaning CVD apparatus

1995-10-25

1997-03-04

Warden, Robert J.

Cleaning and liquid contact with solids

Processes

Combined

134 221, B08B 704

Patent

active

056075154

ABSTRACT:
A vacuum CVD apparatus including a reaction chamber into which a fluorine-containing compound gas and a carrier gas are introduced for cleaning. The fluorine-containing compound gas reacts with the matter deposited on the inner surface of the reaction chamber to gasify and remove the matter, preventing contamination of a semiconductor wafer later placed in the reaction chamber. Thus, it is possible to achieve high reliability of VSLIs produced in the reaction chamber.

REFERENCES:
patent: 5109562 (1992-05-01), Albrecht
patent: 5254176 (1993-10-01), Ibuka et al.
patent: 5271264 (1993-12-01), Chanayem
patent: 5294262 (1994-05-01), Nishimura

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