Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1996-12-09
2000-02-15
Gulakowski, Randy
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 13, 134 26, 134 30, 427299, 438694, 438770, 438771, B08B 300
Patent
active
060248017
ABSTRACT:
A method of cleaning and treating a device, including those of the micromechanical (10) and semiconductor type. The surface of a device, such as the landing electrode (22) of a digital micromirror device (10), is first cleaned with a supercritical fluid (SCF) in a chamber (50) to remove soluble chemical compounds, and then maintained in the SCF chamber until and during the subsequent passivation step. Passivants including PFDA and PFPE are suitable for the present invention. By maintaining the device in the SCF chamber, and without exposing the device to, for instance, the ambient of a clean room, organic and inorganic contaminants cannot be deposited upon the cleaned surface prior to the passivation step. The present invention derives technical advantages by providing an improved passivated surface that is suited to extend the useful operation life of devices, including those of the micromechanical type, reducing stiction forces between contacting elements such as a mirror and its landing electrode. The present invention is also suitable for cleaning and passivating other surfaces including a surface of semiconductor wafers, and the surface of a hard disk memory drive.
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Douglas Monte A.
Wallace Robert M.
Brill Charles A.
Chaudhry Saeed
Donaldson Richard L.
Gulakowski Randy
Telecky Jr. Frederick J.
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