Method of cleaning a process tube with ClF.sub.3 gas and control

Details Method of cleaning a process tube with ClF.sub.3 gas and control Method of cleaning a process tube with ClF.sub.3 gas and control

1993-06-24

1994-03-15

Breneman, R. Bruce

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

134 31, 134 37, 134 42, 156643, 156646, B08B 900

Patent

active

052942627

ABSTRACT:
A method of cleaning a process tube and a wafer boat, comprising the steps of, carrying wafers out of the process tube, controlling the temperature in the process tube saw as or lower than a process temperature and higher than a boiling point of ClF.sub.3, said process temperature being kept in the process tube when the process of forming film on the wafers is carried out in the process tube, and supplying ClF.sub.3 -contained cleaning gas into the process tube to react the cleaning gas with the film of the silicon oxide adhering to the inner wall of the process tube and the wafer boat.

REFERENCES:
patent: 4310380 (1982-01-01), Flamm et al.
patent: 4568410 (1986-02-01), Thornquist
patent: 5022961 (1991-06-01), Izumi et al.

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