Method of cleaning a photo-mask

Details Method of cleaning a photo-mask Method of cleaning a photo-mask

1984-04-20

1986-02-11

Caroff, Marc L.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

15 15R, 15 77, 134 2, 134 3, 134 6, 134 9, 134 28, 134 29, 134 30, 134 31, B08B 102, B08B 104, B08B 600, B08B 704

Patent

active

045696950

ABSTRACT:
A photo-mask to be used in a light exposure step for manufacturing semiconductor devices is cleaned by wetting front and rear surfaces of the mask with a liquid, brushing the wetted surfaces with a pair of rotary brushes, wetting the brushed surfaces with an electrolytic solution containing sufficient electrolyte to substantially eliminate electrostatic charge from the surfaces, spraying and immersing the photo-mask in an organic liquid such as an alcohol, and then drying the photo-mask.

REFERENCES:
patent: 2151457 (1939-03-01), Williams
patent: 2358334 (1944-09-01), Knowlton
patent: 3117333 (1964-01-01), Murray et al.
patent: 3691582 (1972-09-01), Call
patent: 4105468 (1978-08-01), Geshner et al.
patent: 4132567 (1979-01-01), Blackwood
patent: 4169807 (1979-10-01), Zuber

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