Method of chemically vapor-depositing a low-stress glass layer

Details Method of chemically vapor-depositing a low-stress glass layer Method of chemically vapor-depositing a low-stress glass layer

1975-12-18

1980-04-01

Hoffman, James R.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From protein or biologically active polypeptide reactant

427 95, C23D 510, C23C 1304, C01B 3312

Patent

active

041962320

ABSTRACT:
A method of chemically vapor-depositing a low-stress glass layer onto a substrate which is heated in an atmosphere including silane, oxygen, and an inert carrier gas, comprises the step of adding water vapor to the atmosphere to increase the water vapor content of the atmosphere substantially above that normally present therein from the oxidation of the silane.

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patent: 3481781 (1969-12-01), Kern
patent: 3511703 (1970-05-01), Peterson
patent: 3850687 (1974-11-01), Kern
Deal, "The Oxidation of Silicon . . . ", (1963) J. Electrochem. Soc., vol. 110, No. 6, pp. 527-532.
Ackerman et al, IBM Tech Discl. Bull., vol. 15, No. 12, May 1973 p. 3888.
Bratter et al, IBM Tech Discl. Bull., vol. 15, No. 2, Jul. 1972 p. 685.
Ghezzo, J. Electrochem. Soc., pp. 1428-1430, vol. 119, No. 10, Oct. 1972.

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