Method of chemical vapor deposition for producing layer variatio

Coating processes – Coating by vapor – gas – or smoke – Moving the base

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4272481, 118730, C23C 1600

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active

057471134

ABSTRACT:
A chemical vapor deposition process for depositing at least one layer of material onto a plurality of substrates is disclosed, which comprises providing a reactor containing a planetary susceptor rotation means comprising a plurality of secondary susceptors for supporting said substrates, wherein said rotation means allows simultaneously at least two significantly different rotation rates for said secondary susceptors, and rotating said secondary susceptors simultaneouly at said two or more rotation rates during at least a portion of depositing said layer, wherein at least one of said two or more signicantly different rotation rates is not zero.

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