Method of chemical mechanical polishing using abrasive...

Abrading – Abrading process – Glass or stone abrading

Reexamination Certificate

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C451S028000

Reexamination Certificate

active

07108586

ABSTRACT:
Particles of strontium carbonate, barium carbonate, strontium sulfate and/or barium sulfate having a sufficient degree of fineness, especially when produced synthetically, are suitable as abrasive agents in chemical mechanical polishing (CMP polishing) of components, e.g., microelectronic components such as silicon wafers. The alkaline earth metal salt compounds are used as slurries in water and/or organic liquids and optionally may contain a dispersing agent, and preferably have a pH value of at least 8.

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